Single crystal solar cell etching process

Which etch process can be used during solar cell processing?

The etching process can be physical and/or chemical, wet or dry, and isotropic or anisotropic. All these etch process variations can be used during solar cell processing. Figure 1: Etching processes divided according to their physical, chemical, or combined (physical and chemical) nature.

Why do solar cells need surface etching?

Solar cells require surface texturing in order to reduce light reflectance, and to enhance light trapping. Anisotropic wet chemical etching is commonly used to form pyramids on the (1 0 1 1. Introduction

Is orientation-selective etching suitable for large-scale solar cell texturing?

Orientation-selective etching can easily obtain microstructures with a high aspect ratio via micro-mask assistant. 21 However, RIE is hard to meet the needs of large-scale solar cell texturing due to the vacuum environment and cost constraints.

How do you Etch A pyramidal surface?

Pyramidal-like surface textures can be achieved by plasma etching, mechanical engraving, and chemical etching. Due to cost efficiency, anisotropic wet chemical etching of (1 0 0) silicon using alkaline solutions such as NaOH, KOH, and TMAH aqueous solutions are broadly accepted as a commercial standard method , .

Does atmospheric plasma remove anisotropic etching behavior of silicon solar cell surface?

In order to obtain the microstructure with the ideal feature and size for silicon solar cell texturing, it is necessary to further study the anisotropic removal behavior of the Si surface etched by low-temperature atmospheric plasma and clarify the topography formation mechanism.

Does atmospheric plasma etch a silicon surface?

The insight into anisotropic etching behavior and topography formation mechanism of the silicon surface textured by atmospheric plasma is valuable for developing a new texturing approach to silicon solar cells.